We report on the on-wafer device
characteristics of 150 and 200 mm GaN-on-Si-based blue LED wafers grown by
metalorganic chemical vapor deposition on Si(111) substrates with
electroluminescence at 447 nm. Excellent uniformity was achieved with standard
deviations of 3.9% for the electroluminescence intensity, 0.6–0.8% for the peak
wavelength and 1.3% for the forward voltage. The high uniformity confirms the
viability of the GaN-on-Si technology on large-diameter substrates for
next-generation LED manufacturing. The reverse bias current leakage mechanism
is also investigated to provide an insight into improving device reliability.
Source:IOPscience
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