Crack-free crystalline AlN film was
synthesized on two-dimensional multilayer hexagonal BN (h-BN) by metal organic
vapor phase epitaxy (MOVPE). The multilayer h-BN was directly grown on sapphire
substrates in wafer scale by MOVPE, with a thickness of 2.9 nm. The AlN film
grown on the h-BN/sapphire presented a smooth surface. We further realized the
exfoliation of AlN film utilizing the weak bonds within h-BN layers. Moreover,
the AlGaN-based deep-ultraviolet light-emitting diodes grown on the
AlN/h-BN/sapphire template exhibited obvious emissions at 281 nm. It is
promising that the multilayer h-BN will pave the way to obtain transferable
high-efficiency devices with wafer scale.
Source:IOPscience
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