Jun 5, 2018

Rapid isothermal processing of silicon wafers

The reduction in the size of semiconductor devices has not only increased their speed and the number that can be fitted on a chip but has also led to the need for very accurately controlled thermal processing of the semiconductor wafers. Conventional furnaces are used as standard in IC processing but now, however, alternative rapid isothermal processing technologies are gaining prominence. An introduction to isothermal processing is presented together with an overview of commercially available systems


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